Available Tools
The following instruments and tools are available in the Albanova Nanolab
Further information about the tools can be found in the MyFab LIMS system (write "albanova" under tool name in optional filters). More information, including a range of spinners, hotplates, ovens, ultrasonic baths etc. can be found on the technical site .
Tool | Manufacturer | Description | |
---|---|---|---|
Wire bonder | Kulicke Soffa 4523D |
Alumina wire, 33 µm diameter |
|
RIE ICP O2/Ar | Oxford | Dry etcher (plasma) | |
Cryo RIE | Oxford | Dry etcher (plasma) with cryo stage | |
Mask Aligner | Karl Suss MJB3 | for photolithographic mask alignment | |
E-beam lithography | Raith 150 | ||
Projection Camera | Canon | for exposure of patterns through photolithographic masks | |
Stylus Profiler | KLA-Tencor P-15 | for measuring thickness of films via step-height | |
Optical Profiler | gbs SmartVis-3D | WLI based optical profiler, 10x obj | |
AFM | Bruker Dimension Icon | versatile system with many modules and accesories | |
AFM | Bruker Dimension FastScan Bio | FastScanning | |
AFM | JPK Nanowizard 3 | mounted on inverted microscope for life science applications | |
AFM | JPK UltraSpeed | top-view optics for materials applications | |
Optical Microscope 1 | Nikon ME600 | Reflection, DIC 5-100x obj | |
Optical Microscope 2 | Nikon ME600 | reflection/transmission, DIC, 5x100x obj | |
Optical Microscope 3 | Nikon Eclipse L200 | wafer, reflection, 5-150x obj | |
Optical Microscope 4 | Nikon ME600 | fluorescence, 10-100x obj | |
FIB/SEM | FEI Nova 200 | Ga FIB, Pt deposition | |
Sputter | AJA Orion | multiple targets | |
Sputter | AJA Orion | Nb, Ti etc | |
Sputter | Edwards Auto 306 | multiple targets | |
e-beam deposition | Eurovac UHV | multiple targets | |
e-beam deposition | Sputnik | Al, ion milling | |
Bipotentiostat | IPS PGU-BI 1000 | for electrochemical AFM | |
Humidifier | CellKraft P2 | flow rates up to 2L/min for in situ AFM studies |